标题:Low loss waveguide in Nd3+-doped silicate glass fabricated by carbon ion implantation
作者:Li, SL; Wang, KM; Chen, F; Wang, XL; Fu, G; Lu, QM; Hu, LL; Shen, DY; Ma, HJ; Nie, R
通讯作者:Wang, KM
作者机构:[Li, SL; Wang, KM; Chen, F; Wang, XL; Fu, G; Lu, QM; Hu, LL; Shen, DY; Ma, HJ; Nie, R]Shandong Univ, Sch Phys & Microelect, Jinan 25 更多
会议名称:9th International Conference on Plasma Surface Engineering
会议日期:SEP 13-17, 2004
来源:SURFACE & COATINGS TECHNOLOGY
出版年:2005
卷:200
期:1-4
页码:598-601
DOI:10.1016/j.surfcoat.2005.02.144
关键词:ion implantation; planar waveguide; Nd3+-doped silicate glass;; propagation loss
摘要:Low loss index enhanced planar waveguides in Nd3+-doped silicate glass were fabricated by 3.0 MeV C+ ion implantation. The enhancement of the refractive index confined the light propagating in the waveguide. The prism-coupling method was used to measure dark modes in the waveguide. The effective refractive indices of the waveguide were obtained based on the dark modes. The moving fiber method was applied to measure the waveguide propagation loss. Loss measured in non-annealed samples is about 0.6 dB/cm. And the waveguide mode optical near-field output at 633 nm was presented. (c) 2005 Elsevier B.V. All rights reserved.
收录类别:CPCI-S;SCOPUS;SCIE
WOS核心被引频次:2
Scopus被引频次:1
资源类型:会议论文;期刊论文
原文链接:https://www.scopus.com/inward/record.uri?eid=2-s2.0-24644523612&doi=10.1016%2fj.surfcoat.2005.02.144&partnerID=40&md5=dba97ce8bf2d01526ffd2bba5d54cada
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