标题:Colloidal monolayer at the air/water interface: Large-area self-assembly and in-situ annealing
作者:Yu, Jie; Zheng, Lu; Geng, Chong; Wang, Xiuyu; Yan, Qingfeng; Wang, Xiaoqing; Shen, Guangqiu; Shen, Dezhong
通讯作者:Yan, Q
作者机构:[Yu, Jie; Zheng, Lu; Geng, Chong; Wang, Xiuyu; Yan, Qingfeng; Wang, Xiaoqing; Shen, Guangqiu; Shen, Dezhong] Tsinghua Univ, Dept Chem, State Key Lab N 更多
会议名称:International Conference on Technological Advances of Thin Films & Surface Coatings
会议日期:JUL 15-17, 2012
来源:THIN SOLID FILMS
出版年:2013
卷:544
页码:557-561
DOI:10.1016/j.tsf.2012.12.069
关键词:Colloidal self-assembly; Tunable interstice size; Nanosphere; lithography; Solvent vapor annealing
摘要:Nanosphere lithography (NSL) has been proved to be an inexpensive, inherently parallel, high-throughput, and materials-general technique for the fabrication of ordered nanoparticle arrays. In this work, we present the fabrication of large-area and exclusively single layer polystyrene colloidal crystal using an air/water interface self-assembly method. The interstice size in the floating colloidal monolayer can be manipulated by a subsequent in-situ annealing with a saturated organic solvent vapor. As a result, large-area, transferrable, and high-crystalline-integrity colloidal masks with controllable interstice sizes for NSL application are achieved. (C) 2012 Elsevier B.V. All rights reserved.
收录类别:CPCI-S;EI;SCOPUS;SCIE
WOS核心被引频次:7
Scopus被引频次:6
资源类型:会议论文;期刊论文
原文链接:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84901820220&doi=10.1016%2fj.tsf.2012.12.069&partnerID=40&md5=4102825b8bc6d88d43d06ec929fb421d
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