标题：Annealing Behavior at Triple Junctions in High-Purity Aluminum After Slight Cold Rolling
作者：Yin, Wenhong; Wang, Weiguo; Fang, Xiaoying; Qin, Congxiang
作者机构：[Yin, Wenhong; Wang, Weiguo; Qin, Congxiang] Shanghai Univ, Inst Mat, Shanghai 200072, Peoples R China.; [Yin, Wenhong; Fang, Xiaoying; Qin, Congxia 更多
通讯作者地址：[Wang, WG]Shanghai Univ, Inst Mat, Shanghai 200072, Peoples R China;[Wang, WG]Fujian Univ Technol, Sch Mat Sci & Engn, Fuzhou 350118, Peoples R China.
来源：JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE
关键词：aluminum; annealing behavior; electron backscatter diffraction; triple; junction
摘要：High-purity polycrystalline aluminum samples with a typical grain size of approximately 30 mu m were slightly cold-rolled with a thickness reduction of 15%, and then, off-line in situ electron backscatter diffraction was used to identify the annealing behavior at triple junctions during annealing at 400 A degrees C. The results show that recrystallization nuclei are developed at some triple junctions during annealing. High-angle grain boundaries migrate from harder grains to softer grains at the triple junctions leading to the formation of nuclei. All such nuclei show I 3 pound orientation relationships with the parent grains, and the bounded I 3 pound boundaries are found to be incoherent. During further annealing, these nuclei are consumed by other growing grains, indicating that their presence is just a release of the strain concentration at the triple junctions.