标题:Ferromagnetic resonance of facing-target sputtered epitaxial γ′-Fe4N films: The influence of thickness and substrates
作者:Lai, Zhengxun ;Li, Zirun ;Liu, Xiang ;Bai, Lihui ;Tian, Yufeng ;Mi, Wenbo
作者机构:[Lai, Zhengxun ;Li, Zirun ;Liu, Xiang ;Mi, Wenbo ] Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, School of S 更多
来源:Journal of Physics D: Applied Physics
出版年:2018
卷:51
期:24
DOI:10.1088/1361-6463/aac2a2
摘要:The microstructure and high frequency properties of facing-target sputtered epitaxial γ′-Fe4N films were investigated in detail. It was found that the eddy current in ultrathin γ′-Fe4N films is too small to influence the ferromagnetic resonance (FMR) linewidth, where the linewidth is mostly determined by intrinsic damping and the two-magnon scattering (TMS) process. In relatively thick films, the TMS process can significantly affect the linewidth due to the roughness on the sample surface. However, the TMS process in a thin film is quite weak because of its smooth surface. The Gilbert damping constant of about 0.0135 in our γ′-Fe4N films is smaller than the experimental value in the previous work. Moreover, substrates can also influence the FMR linewidth of the γ′-Fe4N films by the TMS process. Besides, the resonance field of polycrystalline γ′-Fe4N film is larger than the epitaxial ones because of the lack of a magnetic anisotropic field, but the linewidth of the polycrystalline γ′-Fe4N film is smaller.
© 2018 IOP Publishing Ltd.
收录类别:EI
资源类型:期刊论文
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