标题:Electronic stopping powers of 80-350 keV F-19 ions in Ta, Nb, Ti refractory metals and Ni0.8Fe0.2 alloy
作者:Tan, CY; Xia, YY; Liu, JT; Liu, XD; Wang, FX
作者机构:[Tan, CY; Xia, YY; Liu, JT; Liu, XD; Wang, FX]SHANDONG UNIV,DEPT PHYS,JINAN 250100,PEOPLES R CHINA.
会议名称:9th International Conference on Ion Beam Modification of Materials (IBMM 95)
会议日期:FEB 05-10, 1995
来源:ION BEAM MODIFICATION OF MATERIALS
出版年:1996
页码:671-674
收录类别:CPCI-S
资源类型:会议论文
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