标题:Fabrication of grating waveguide using photopolymerization
作者:Yao, SS; Qin, XY; Yu, XQ; Zhang, Q; Xu, GH; Wang, ZY; Dong, Y; Jing, XY; Sun, YM; Huang, BB
通讯作者:Yao, S.-S.
作者机构:[Yao, S.-S] State Key Laboratory of Crystal Materials, Shandong University, Ji'nan 250100, China;[ Qin, X.-Y] State Key Laboratory of Crystal Material 更多
会议名称:5th International Forum on Advanced Material Science and Technology
会议日期:JUN 14-17, 2006
来源:中国有色金属学会会刊(英文版)
出版年:2006
卷:16
期:SUPPL.
页码:88-91
DOI:10.1016/S1003-6326(06)60149-0
关键词:two-photon initiated photopolymerization;grating waveguide
摘要:Two ternary materials systems,which comprise photoinitiator/two-photon initiators,oligomer and binder were prepared. Polymeric waveguide film was manufactured by spinning the materials on optical glass (refraction index=1.5),the two-photon initiated photopolymerization (TPIP) and single-photon holographic photopolymerization were carried out respectively in the polymer waveguide film. The preparation of these materials was explained and absorption spectra were tested. The experimental results including the micrographs and diffraction patterns verifying the formation of grating waveguide structures were given. The results show that grating waveguide microstructures can be holographically fabricated by single-photon photopolymerization with low-power (tens mW ) continuous-wave (CW) laser at 532 nm successfully. Because the continuous-wave laser at 532 nm is handier than one at 514 nm.
收录类别:CPCI-S;EI;SCOPUS;SCIE
资源类型:会议论文;期刊论文
原文链接:https://www.scopus.com/inward/record.uri?eid=2-s2.0-33746859417&doi=10.1016%2fS1003-6326%2806%2960149-0&partnerID=40&md5=0ad0eb362e8bc40beacbf1c01df63923
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