标题：Effects of deposition temperature on the structural and optical properties of single crystalline rutile TiO2films
作者：Wang, Weiguang ;Wang, Mingxian ;Feng, Xianjin ;Zhao, Wei ;Luan, Caina ;Ma, Jin
作者机构：[Wang, Weiguang ;Wang, Mingxian ;Feng, Xianjin ;Zhao, Wei ;Luan, Caina ;Ma, Jin ] School of Microelectronics, Shandong University, Jinan; 250100, Chin 更多
来源：Materials Chemistry and Physics
摘要：Rutile phase titanium dioxide (TiO2) thin films were grown on α-Al2O3(100) substrates at different deposition temperatures (500–650 °C) by the metalorganic chemical vapor deposition method. The analyses of X-ray diffraction θ-2θ scan indicated that the deposition temperature had an obvious influence on the crystal quality of the TiO2films. Single crystalline rutile TiO2films can be obtained from a relatively low deposition temperature of 500 °C–600 °C, and the film grown at 550 °C exhibited the best crystallinity, for which the composition and epitaxial relationship were identified. The effects of deposition temperature on the deposition rate and optical properties of the films have been investigated in detail.
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