标题：Simulation and Optimization of Temperature Distribution in Induction Heating Reactor
作者：Mei, Shuzhe; Wang, Quan; Xu, Jiankai; Yin, Haibo; Xiao, Hongling; Feng, Chun; Jiang, Lijuan; Wang, Xiaoliang; Liu, Fengqi; Xu, Xiang 更多 作者机构：[Mei, Shuzhe; Wang, Quan; Xu, Jiankai; Yin, Haibo; Xiao, Hongling; Feng, Chun; Jiang, Lijuan; Wang, Xiaoliang; Liu, Fengqi; Wang, Zhanguo] Chinese Aca 更多
通讯作者：Wang, XL;Wang, XL;Wang, Xiaoliang
通讯作者地址：[Wang, XL]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China;[Wang, XL]Univ Chinese Acad Sci, Coll Mat Sci & O 更多
来源：JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
关键词：Simulation; Temperature Distribution; Induction Heating
摘要：The temperature field in the induction-heated metal-organic chemical vapor deposition reactor was modeled and simulated by the finite element method. The simulation results show that the temperature distribution of the graphite susceptor is very non-uniform due to the heat conduction in the central region of the graphite susceptor throughout the rotating shaft. In order to reduce the heat loss at the center of the graphite susceptor, the structure of the reactor was analyzed and optimized. It has been observed that in the induction heating system, the temperature uniformity of the graphite susceptor can be effectively improved by adding air gaps and heat transfer tracks. The alternating current coils in three different arrangements were numerically studied and optimized. Two of them can achieve almost the same effect, greatly improving the temperature uniformity and heating efficiency, which is of great significance for improving the quality of epitaxial semiconductor thin films and nanostructures.