标题:The structural and electrical studies on the Boron-doped SnO_2 films deposited by spray pyrolysis
作者:Zhang, B.;Tian, Y.;Zhang, J.X.;Cai, W.
通讯作者:Zhang, J X
作者机构:[Zhang, B] School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China, Key Laboratory for Liquid-Solid Structur 更多
会议名称:4th Vacuum and Surface Science Conference of Asia and Australia
会议日期:OCT 28-31, 2008
来源:Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology
出版年:2011
卷:85
期:11
页码:986-989
DOI:10.1016/j.vacuum.2011.02.005
关键词:BTO;FTIR;Scattering mechanism;Structural
摘要:The boron-doped SnO_2 (BTO) films were prepared by spray pyrolysis. The XRD results shows the preferred orientation of the BTO films changes from plane (110) to (101) as the increasing of boron concentration in SnO_2, which further leads to the variation of grains shape on the surfaces. The FTIR and Hall-Effect results indicate the solution process: the boron ions prefer to occupy the interstitial site in SnO_2 lattice, which play the role of donor of free electrons; while beyond a certain boron concentration, boron ions start to replace the tin ions of lattice, which has a negative effect on carrier concentration. The scattering mechanism of BTO is also discussed in the paper based on the grain size and meal free path.
收录类别:CPCI-S;EI;SCOPUS;SCIE
WOS核心被引频次:15
Scopus被引频次:14
资源类型:会议论文;期刊论文
原文链接:https://www.scopus.com/inward/record.uri?eid=2-s2.0-79955851751&doi=10.1016%2fj.vacuum.2011.02.005&partnerID=40&md5=a1fbdb85ed7edad0ed8a124586f90397
TOP