标题：Effects of deposition rate on the structural, morphological and optical properties of brookite TiO2films prepared by MOCVD
作者：Wanga, Wei Guang ;Wang, Ming Xian ;Feng, Xian Jin ;Ma, Jin
通讯作者：Feng, Xian Jin
作者机构：[Wanga, Wei Guang ;Wang, Ming Xian ;Feng, Xian Jin ;Ma, Jin ] School of Microelectronics, Shandong University, Jinan; 250100, China
会议名称：17th IUMRS International Conference in Asia, IUMRS-ICA 2016
会议日期：October 20, 2016 - October 24, 2016
来源：Materials Science Forum
摘要：Compared to anatase and rutile TiO2, the brookite TiO2(b-TiO2) is relatively seldom investigated, because it is difficult to be prepared. In order to explore a scientific and effective approach to prepare high quality b-TiO2crystalline films, the effects of deposition rate on the properties of b-TiO2films prepared on yttria-stabilized zirconia (YSZ) (110) substrates by metal organic chemical vapor deposition (MOCVD) were investigated in this study. The structural analyses indicated that the b-TiO2film prepared with the lowest deposition rate of 1.25 Å/min had the best single crystalline quality for which the epitaxial relationship between the film and substrate was determined as b-TiO2(120) || YSZ(110) with an in-plane epitaxial relationship of b-TiO2|| YSZ and b-TiO2[2 1 0]||YSZ[1 1 0]. The RMS surface roughness of the obtained films decreased from 7.02 to 1.11 nm as the deposition rate decreased. The average transmittances of all the obtained b-TiO2films exceeded 90% in the visible range. The optical band gaps increased from 3.54 to 3.63 eV as the deposition rate decreased. Apparently, the deposition rate has a significant influence on the structural, morphological and optical properties. Therefore, it provides a practicable way to manipulate such properties of b-TiO2films for different applications in the field of transparent optoelectronic devices.
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