标题:Relaxation of thermal residual stress in laser irradiated fused silica by annealing process
作者:Li, Run Qiang ;Yao, Peng ;Wang, Wei ;Wang, Jun ;Huang, Chuan Zhen ;Yang, Zhi Hong ;Liu, Yue
通讯作者:Yao, Peng
作者机构:[Li, Run Qiang ;Yao, Peng ;Wang, Wei ;Wang, Jun ;Huang, Chuan Zhen ;Yang, Zhi Hong ;Liu, Yue ] Key Laboratory of High Efficiency and Clean Mechanical 更多
会议名称:19th International Symposium on Advances in Abrasive Technology, ISAAT 2016
会议日期:2 October 2016 through 5 October 2016
来源:Materials Science Forum
出版年:2016
卷:874
页码:345-350
DOI:10.4028/www.scientific.net/MSF.874.345
关键词:Anneal; FEM; Fused silica; Residual stress; Viscoelasticity
摘要:To relax the surface residual stress of fused silica lens or windows irradiated by CO2 laser, it was proposed to treat it at high temperature above glass strain temperature in the traditional annealing process. However it is a time and energy consuming process, and a distortion will be introduced during the heat treatment. To deal with these problems, annealing temperatures lower than glass strain temperature were applied to the annealing process and a new scheme was designed in this paper. An numerical model was built to simulate the laser induced residual stress and optimize the stress variation in the annealing process. The surface stress of fused silica can be relaxed and deformation induced by heat treating can be ignored. © 2016 Trans Tech Publications, Switzerland.
收录类别:EI;SCOPUS
资源类型:会议论文;期刊论文
原文链接:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84991713019&doi=10.4028%2fwww.scientific.net%2fMSF.874.345&partnerID=40&md5=8c59e3f7602d9239ce4bb5b942b00e96
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