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1. The effects of annealing on nano-silicon carbide films grown by magnetron sputtering method CPCI-S SCOPUS SCIE

作者:An, X; Zhuang, HZ; Yang, YG; Li, HX; Xue, CS

作者机构:[An, X; Zhuang, HZ; Yang, YG; Li, HX; Xue, CS]Shandong Normal Univ, Inst Semicond, Jinan 250014, Peoples R China.;[An, X; Zhuang, HZ; Yang, YG; Li, HX; Xue, CS] Shandong Univ, Inst Phys & Microelectron, Jinan 250100, Peoples R China.

会议名称:Seminar on Recent Development of Advanced Materials and Their Development Trends in the 21st Century

会议日期:SEP 16-20, 2001

来源:RARE METAL MATERIALS AND ENGINEERING,2001,Vol.30,556-559

资源类型:会议论文;期刊论文

WOS:000175387800111

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